Business Business Area

Clean Room System

Semiconductor / General Cleanroom

A Clean Room is a space designed to control environmental conditions such as dust, particulates, temperature, humidity, static electricity, illumination, and air pressure to values required to remove all airborne particles that cause significant interference in the research and development and production processes of advanced industries. In the case of a semiconductor Clean Room, it is a room that maintains a high degree of cleanliness based on a 1~100 CLASS standard.

Cleanroom Structure

Classification in the Cleanroom according to the airflow method

Item	Vertical Laminar Flow	Horizontal Laminar Flow	Turbulent Flow	Tunnel Method (CTM)
Cleanliness	Class 1~100	Class 100	Class 1,000~100,000	Class 1~100
Operating Cost	High	Medium	Low	Medium
Layout Change	Easy	Difficult	Easy	Difficult
Features	The method suitable for maintaining high cleanliness forms a vertical laminar flow, and the indoor wind speed is formed at 0.25~0.5m/s.	Applied to maintain high cleanliness by forming a horizontal laminar flow, but the cleanliness of the upper and lower layers may vary depending on the working conditions.	Applied to medium-grade cleanrooms by forming a vertical turbulent flow, forming an uneven and irregular airflow distribution. Ventilation frequency 20~80 times applied.	It is possible to form a unit type by applying a local vertical laminar flow method, and it is easy to maintain local high cleanliness.
Expandability	Difficult	Difficult	Somewhat Difficult	Expandable for each line
Applicable Equipment	FFU System, A/F System, Dry Coil System, OAC System	AHU System, Air Filter System	HFU System, BFU System, AHU System	CTM System, A/F System
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Cleanroom Specifications: Cleanliness Standard

CLASS	PARTICLE (EA/μm)
CLASS	0.1μm	0.2μm	0.3μm	0.4μm	0.5μm
1	35	7.5	3	1	-
10	350	75	30	10	-
100	-	750	300	100	-
1,000	-	-	-	1,000	7
10,000	-	-	-	10,000	70
100,000	-	-	-	100,000	700

U.S. Federal Standard: Cleanliness classes 1~100000 are classified according to the number of particles larger than 0.5μm per cubic foot of air. In the Fed standard, the expression for the case where there are 100 or fewer particles of 0.5μm per unit volume is called Class 100.

Cleanroom (ICR) Construction Sites

Seonsan factory, SK Innovation

Daegu factory, SSLM

Kongju factory, SOULBRAIN

Daejeon factory, SK Innovation

Inchon factory, CELESTICA

Tyco Electronics AMP

GMP

GMP (Good Manufacturing Practice) is a set of management standards necessary for all processes from the purchase of raw materials to manufacturing and shipping in a factory to produce excellent pharmaceuticals. It requires a cleanroom facility that meets these standards and must obtain GMP facility certification from the Food Promotion Agency. It can also be applied to cosmetic manufacturing facilities and health functional foods in addition to pharmaceutical factories.
GLP

GLP (Good Laboratory Practice) is a standard for transparently managing all information on toxicity tests conducted to ensure the safety of pharmaceuticals. A cleanroom facility (germ-free animals, SPF breeding rooms) that meets these management standards must be established.
HACCP

HACCP (Hazard Analysis and Critical Control Point) is a scientific hygiene management system to ensure food safety through autonomous, systematic, and efficient management by identifying hazard factors that may occur at each stage from food raw materials to manufacturing, processing, preservation, distribution, cooking stages, and before final consumers consume, and determining critical control points to manage these factors intensively.